Reconciling measurements in AFM reference metrology when using different probing techniques
- Narender Rana
- Charles Archie
- et al.
- 2011
- SPIE Advanced Lithography 2011
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12 results for Charles Archie
Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010
Hybrid reference metrology exploiting patterning simulation
- Narender Rana
- Chas Archie
- 2010
- SPIE Advanced Lithography 2010
The measurement uncertainty challenge of advanced patterning development 727203
- Narender Rana
- Chas Archie
- et al.
- 2009
- SPIE Advanced Lithography 2009
Challenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008
Investigation on the mechanism of the 193nm resist linewidth reduction during the SEM measurement
- C.-H.J. Wu
- Wu-Song Huang
- et al.
- 2001
- Microlithography 2001
Skew quadrupole effects in the IBM compact synchrotron
- Chas N. Archie
- 1993
- Biennial Particle Accelerator Conference 1993
Tracking studies for the Oxford Instruments compact electron synchrotron
- Chas N. Archie
- Jan Uythoven
- 1991
- Biennial Particle Accelerator Conference 1991
Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes
- Shoji Hotta
- Takumichi Sutani
- et al.
- 2011
- J. Micro/Nanolithogr. MEMS MOEMS
Review of current progress in nanometrology with the helium ion microscope
- Michael T. Postek
- András Vladár
- et al.
- 2010
- Measurement Science and Technology