Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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94 results for Fenton R. McFeely

Low-temperature selective-area deposition of metals: Chemical vapor deposition of gold from ethyl(trimethylphosphine)gold(I)
- - M.M. Banaszak Holl
  - P.F. Seidler
  - et al.
- 1993
- Applied Physics Letters
Impact ionization in silicon
- - E. Cartier
  - M.V. Fischetti
  - et al.
- 1993
- Applied Physics Letters
The chemisorption and reaction of GeCl₄ with Si(100)
- - D.A. Lapiano-Smith
  - F.R. McFeely
- 1993
- Thin Solid Films
X-ray photoelectron spectroscopic studies of chemical vapor deposition with TaF₅ precursor on polyimide surfaces
- - D. Ugolini
  - S.P. Kowalczyk
  - et al.
- 1992
- Journal of Applied Physics
A mechanism for diborane induced selectivity loss in the chemical vapor deposition of silicon from SiH₂Cl₂
- - D.A. Lapiano-Smith
  - F.R. McFeely
- 1992
- Journal of Applied Physics
The chemisorption and reaction of BCl₃ with Si(111)
- - D.A. Lapiano-Smith
  - F.R. McFeely
- 1992
- Journal of Applied Physics
Photoelectron spectroscopy studies of chemical vapor deposition of Ta from a TaF₅ precursor on Si and SiO₂ substrates
- - D. Ugolini
  - S.P. Kowalczyk
  - et al.
- 1991
- Journal of Applied Physics
Hot-electron dynamics in SiO2 studied by soft-x-ray-induced core-level photoemission
- - E. Cartier
  - F.R. McFeely
- 1991
- Physical Review B
Pressure dependence of oxide growth rate on silicon and metal silicides
- - L.J Terminello
  - J.A Yarmoff
  - et al.
- 1991
- Surface Science
Comparison of the selective adsorption and reactivity behavior of WF ₆ and TaF₅ on SiO₂ and polyimide surfaces
- - F.R. McFeely
  - L.J. Terminello
  - et al.
- 1990
- Applied Physics Letters