Atomic layer epitaxy of silicon by dichlorosilane studied with core level spectroscopy
- J.A. Yarmoff
- D.K. Shuh
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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94 results for Fenton R. McFeely
Photoelectron spectroscopy studies of chemical vapor deposition of Ta from a TaF5 precursor on Si and SiO2 substrates
- D. Ugolini
- S.P. Kowalczyk
- et al.
- 1991
- Journal of Applied Physics
Hot-electron dynamics in SiO2 studied by soft-x-ray-induced core-level photoemission
- E. Cartier
- F.R. McFeely
- 1991
- Physical Review B
Pressure dependence of oxide growth rate on silicon and metal silicides
- L.J Terminello
- J.A Yarmoff
- et al.
- 1991
- Surface Science
Comparison of the selective adsorption and reactivity behavior of WF 6 and TaF5 on SiO2 and polyimide surfaces
- F.R. McFeely
- L.J. Terminello
- et al.
- 1990
- Applied Physics Letters
Soft-x-ray induced core-level photoemission as a probe of hot-electron dynamics in SiO2
- F.R. McFeely
- E. Cartier
- et al.
- 1990
- Physical Review Letters
Low-energy-electron escape lengths in SiO2
- F.R. McFeely
- E. Cartier
- et al.
- 1990
- Physical Review B
The chemisorption of chlorosilanes and chlorine on Si(111)7 × 7
- L.J Whitman
- S.A Joyce
- et al.
- 1990
- Surface Science
Si2Cl6and Si2H6adsorption on CaF2/Si(111)
- L.J. Terminello
- F.J. Himpsel
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electron attenuation lengths at SiO2/Si interfaces
- J.A. Yarmoff
- S.A. Joyce
- et al.
- 1990
- Journal of Electron Spectroscopy and Related Phenomena