Bennett Robinson, F.R. McFeely
Journal of Applied Physics
The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO 2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This trend is explained by differences in molecular structure and suggests a general basis for predicting selective deposition.
Bennett Robinson, F.R. McFeely
Journal of Applied Physics
J.J. Jia, T.A. Callcott, et al.
Review of Scientific Instruments
E.A. Eklund, F.R. McFeely, et al.
Physical Review Letters
D.A. Lapiano-Smith, F.R. McFeely
Thin Solid Films