Understanding stress gradients in microelectronic metallization
- Conal E. Murray
- E. Todd Ryan
- et al.
- 2012
- Powder Diffraction
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15 results for Paul R. Besser
Evolution of stress gradients in Cu films and features induced by capping layers
- Conal E. Murray
- E.T. Ryan
- et al.
- 2012
- Microelectronic Engineering
Manipulating stress in Cu/low-k dielectric nanocomposites
- Conal E. Murray
- Paul R. Besser
- et al.
- 2011
- Applied Physics Letters
Triaxial stress distributions in Cu/low-k interconnect features
- Conal E. Murray
- Paul R. Besser
- et al.
- 2011
- Applied Physics Letters
Stress gradients observed in Cu thin films induced by capping layers
- Conal E. Murray
- Paul R. Besser
- et al.
- 2011
- Journal of Materials Research
In situ evolution of stress gradients in Cu films induced by capping layers
- Conal E. Murray
- Paul R. Besser
- et al.
- 2010
- Applied Physics Letters
Stress gradients observed in Cu thin films induced by capping layers
- Conal E. Murray
- Paul R. Besser
- et al.
- 2009
- MRS Spring Meeting 2009
Stress gradients induced in Cu films by capping layers
- Conal E. Murray
- Paul R. Besser
- et al.
- 2008
- Applied Physics Letters
Silicide challenges for 22nm technologies and beyond
- Paul R. Besser
- Christian Lavoie
- et al.
- 2008
- ECS Meeting 2008
Material and integration issues for rare-Earth Silicides as gate and diffusion contacts in advanced CMOS
- C. D'Emic
- K. Ohuchi
- et al.
- 2008
- ECS Meeting 2008