The chemisorption of SiCl4, Si2Cl6 and chlorine on Si(111) 7 × 7
- L.J. Whitman
- S.A. Joyce
- et al.
- 1990
- Vacuum
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30 results for Jory A. Yarmoff
Electron attenuation lengths at SiO2/Si interfaces
- J.A. Yarmoff
- S.A. Joyce
- et al.
- 1990
- Journal of Electron Spectroscopy and Related Phenomena
Photoelectron spectroscopic study of the interaction of thin Fe films with the MoS2(0001) surface
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Surface Science
Chemical effects of Ne+ bombardment on the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Surface Science
The chemical interaction of Mn with the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- Jeffrey R. Lince
- Thomas B. Stewart
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The interaction of CF3 radicals and CF3 radical precursors with SiO2 surfaces
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- Surface Science
Mechanism for chemical-vapor deposition of tungsten on silicon from tungsten hexafluoride
- Jory A. Yarmoff
- F. Read McFeely
- 1988
- Journal of Applied Physics
Microscopic structure of the SiO2/Si interface
- F.J. Himpsel
- F.R. McFeely
- et al.
- 1988
- Physical Review B
Effect of sample doping level during etching of silicon by fluorine atoms
- J.A. Yarmoff
- F.R. McFeely
- 1988
- Physical Review B
Chemical selectivity in photon-stimulated desorption of fluorine from silicon
- J.A. Yarmoff
- A. Taleb-Ibrahimi
- et al.
- 1988
- Physical Review Letters