Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- Luisa D. Bozano
- Phillip J. Brock
- et al.
- 2011
- SPIE Advanced Lithography 2011
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44 results for Luisa Bozano
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new route to ultra-high density memory using the Micro to Nano Addressing Block (MNAB)
- R.S. Shenoy
- K. Gopalakrishnan
- et al.
- 2006
- VLSI Technology 2006
Spirobifluorene-linked orthogonal polymers with controlled conjugation lengths
- R.D. Miller
- F. Dötz
- et al.
- 2002
- ACS National Meeting 2002
Injection, transport and recombination in organic light-emitting diodes
- J.C. Scott
- George G. Malliaras
- et al.
- 1998
- SPIE Optical Science, Engineering, and Instrumentation 1998
A three-dimensional micro-electrode array for in-vitro neuronal interfacing
- Andrea Spanu
- Nicolò Colistra
- et al.
- 2020
- Journal of Neural Engineering
Chemical sensor systems based on 2D and thin film materials
- Charles Mackin
- Andrea Fasoli
- et al.
- 2020
- 2D Materials