Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013
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15 results for Mike Hibbs
Two-dimensional mask effects at the 14 nm logic node
- A.E. Zweber
- A.E. McGuire
- et al.
- 2013
- SPIE Photomask Technology 2013
Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Evaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008
Phase calibration for attenuating phase-shift masks
- Michael S. Hibbs
- Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Rama N. Singh
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems