Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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15 results for Mike Hibbs

Quantitative stepper metrology using the focus monitor test mask
- - T.A. Brunner
  - A.L. Martin
  - et al.
- 1994
- Microlithography 1994
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- - Greg McIntyre
  - Michael Hibbs
  - et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Evaluation of molybdenum silicide for use as a 193 nm phase-shifting absorber in photomask manufacturing
- - M. Hibbs
  - M. Ushida
  - et al.
- 2001
- Proceedings of SPIE- The International Society for Optical Engineering
Optimum mask and source patterns to print a given shape
- - Alan E. Rosenbluth
  - Scott Bukofsky
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- - S. Jay Chey
  - C.R. Guarnieri
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering