Phase formation and stability of Ni silicide contacts - Scaling to ultra-thin films
- C. Detavernier
- K. De Keyser
- et al.
- 2010
- ICSICT 2010
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8 results for C. Van Bockstael
Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)
- K. De Keyser
- C. Van Bockstael
- et al.
- 2010
- Applied Physics Letters
In situ study of the formation of silicide phases in amorphous Co-Si mixed layers
- C. Van Bockstael
- K. De Keyser
- et al.
- 2010
- Microelectronic Engineering
In situ study of the formation of silicide phases in amorphous Ni-Si mixed layers
- C. Van Bockstael
- C. Detavernier
- et al.
- 2009
- Journal of Applied Physics
Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2009
- Applied Physics Letters
Effect of Pt addition on growth stress and thermal stress of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2008
- Journal of Applied Physics
Epitaxial formation of a metastable hexagonal nickel-silicide
- K. De Keyser
- C. Van Bockstael
- et al.
- 2008
- Electrochemical and Solid-State Letters
Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
- C. Torregiani
- C. Van Bockstael
- et al.
- 2007
- Microelectronic Engineering