Publications

97 results for Karen Petrillo

New Photoacid Generators Designed for Advanced EUV Patterning
- - Kamal P. Pandey
  - Emad Aqad
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- - KwangMo Choi
  - YunJi Kim
  - et al.
- 2025
- SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- - Benjamin D. Rafael-Naab
  - Jong Keun Park
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists
- - Cong Liu
  - Joseph Lachowski
  - et al.
- 2025
- SPIE Advanced Lithography 2025
New Molecular Resist Design for Advanced Patterning
- - Vageesha Liyana Gunawardana
  - Emad Aqad
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic Performance
- - EuiJin Ko
  - YooRim Jang
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators
- - Jayoung Koo
  - YunJi Kim
  - et al.
- 2024
- SPIE Advanced Lithography 2024
Novel spin-on overcoat materials for EUV photoresist enhancement
- - Xisen Hou
  - Yinjie Cen
  - et al.
- 2024
- SPIE Advanced Lithography 2024
Disruptive non-fluorinated photoacid generators using computational chemistry and library design
- - P. Labeaume
  - K. Hernandez
  - et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- - Yinjie Cen
  - Jong Keun Park
  - et al.
- 2024
- SPIE Advanced Lithography 2024