Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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85 results for Karen Petrillo

22 nm technology compatible fully functional 0.1 μm ² 6T-sram cell
- - B. Haran
  - A. Kumar
  - et al.
- 2008
- IEDM 2008
HIGHLY LATCHUP-IMMUNE 1- mu m CMOS TECHNOLOGY FABRICATED WITH 1 Mev ION IMPLANTATION AND SELF-ALIGNED TiSi//2.
- - F.S. Lai
  - L.K. Wang
  - et al.
- 1984
- IEDM 1984
Advanced EUV Resist Characterization using Scatterometry and Machine Learning
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2021
- ASMC 2021
EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- - A. Dutta
  - Jennifer Church
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resists
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Material and process improvements towards sub 36nm pitch EUV single exposure
- - Karen Petrillo
  - Dave Hetzer
  - et al.
- 2019
- ANTS 2019
The defect mitigation on EUV stack by track based technology
- - Naoki Shibata
  - Lior Huli
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Track based techniques to improve high-resolution EUV patterning defectivity
- - Naoki Shibata
  - Lior Huli
  - et al.
- 2018
- EUVL 2018