Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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85 results for Karen Petrillo

Defect detection strategies and process partitioning for SE EUV patterning
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- - Koichi Hontake
  - Lior Huli
  - et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Unexpected impact of RIE gases on lithographic films
- - Martin Glodde
  - Robert L. Bruce
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Driving down defect density in composite EUV patterning film stacks
- - Luciana Meli
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Towards production ready processing with a state-of-the-art EUV cluster
- - Karen Petrillo
  - Nicole Saulnier
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- - Nobuhiro Okai
  - Erin Lavigne
  - et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- - Greg McIntyre
  - Leon Teeuwen
  - et al.
- 2013
- SPIE Advanced Lithography 2013