Ion-induced etching of SiO2: The influence of mixing and lattice damage
- Harold F. Winters
- 1988
- Journal of Applied Physics
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Phenomena produced by ion bombardment in plasma-assisted etching environments
- Harold F. Winters
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Influence of doping on the etching of Si(111)
- Harold F. Winters
- D. Haarer
- 1987
- Physical Review B
The role of energetic ion bombardment in silicon-fluorine chemistry
- J.W. Coburn
- H.F. Winters
- 1987
- Nuclear Inst. and Methods in Physics Research, B
Influence of ion bombardment on the interaction of Sb with the Si(100) surface
- S.A. Barnett
- H.F. Winters
- et al.
- 1987
- Surface Science
Sputtering of chemisorbed nitrogen from single-crystal planes of tungsten and molybdenum
- Harold F. Winters
- E. Taglauer
- 1987
- Physical Review B
Ion-induced volatilization (IIV): A method for quantitative measurement of the amounts of perfluoropolyether lubricant on a particulate disk surface and in the media porosity
- J.W. Coburn
- H.F. Winters
- 1986
- Journal of Applied Physics
The interaction of Sb4 molecular beams with Si(100) surfaces: Modulated-beam mass spectrometry and thermally stimulated desorption studies
- S.A. Barnett
- Harold F. Winters
- et al.
- 1986
- Surface Science
The etching of Cu(100) with Cl2
- Harold F. Winters
- 1985
- JVSTA
Plasma-assisted etching: Ion-assisted surface chemistry
- J.W. Coburn
- Harold F. Winters
- 1985
- Applications of Surface Science