Effects of oxygen on the rie characteristics of aluminum films
- S.P. Holland
- Graham Olive
- et al.
- 2019
- JES
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
30 results for J.M. Eldridge
Various Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
Oxidation of Plasma-Deposited α-SixC1-x:H Films
- J.M. Eldridge
- J.O. Moore
- et al.
- 2019
- JES
Structure of thin lead oxide layers as determined by x-ray diffraction
- T.B. Light
- J.M. Eldridge
- et al.
- 2008
- Journal of Applied Physics
Effects of applied stress on UHV-deposited Fe1-xPdx thin films
- M.H. Lee
- J.M. Eldridge
- et al.
- 2008
- Journal of Applied Physics
Polarization of thin phosphosilicate glass films in MGOS structures
- J.M. Eldridge
- R.B. Laibowitz
- et al.
- 2003
- Journal of Applied Physics
Tunneling in lead-lead oxide-lead junctions
- S. Basavaiah
- J.M. Eldridge
- et al.
- 2003
- Journal of Applied Physics
Some mechanical and thermal properties of PECVD a-SixC1-x: H and a-SixN1-x: H films prepared by mixed frequency plasma processes
- V.J. Minkiewicz
- J. Stasiak
- et al.
- 1994
- Surface and Coatings Technology
Some Factors Affecting Hillock Formation due to PECVD Processing of Sputtered Al-4% Cu-1% Si Films
- V.J. Minkiewicz
- J.O. Moore
- et al.
- 1992
- JES
Reactive ion etching induced corrosion of Al and Al-Cu films
- Wen-Yaung Lee
- J.M. Eldridge
- et al.
- 1981
- Journal of Applied Physics