Effects of oxygen on the rie characteristics of aluminum films
- S.P. Holland
- Graham Olive
- et al.
- 2019
- JES
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30 results for J.M. Eldridge
Various Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
Oxidation of Plasma-Deposited α-SixC1-x:H Films
- J.M. Eldridge
- J.O. Moore
- et al.
- 2019
- JES
Structure of thin lead oxide layers as determined by x-ray diffraction
- T.B. Light
- J.M. Eldridge
- et al.
- 2008
- Journal of Applied Physics
Effects of applied stress on UHV-deposited Fe1-xPdx thin films
- M.H. Lee
- J.M. Eldridge
- et al.
- 2008
- Journal of Applied Physics
Polarization of thin phosphosilicate glass films in MGOS structures
- J.M. Eldridge
- R.B. Laibowitz
- et al.
- 2003
- Journal of Applied Physics
Tunneling in lead-lead oxide-lead junctions
- S. Basavaiah
- J.M. Eldridge
- et al.
- 2003
- Journal of Applied Physics
Some mechanical and thermal properties of PECVD a-SixC1-x: H and a-SixN1-x: H films prepared by mixed frequency plasma processes
- V.J. Minkiewicz
- J. Stasiak
- et al.
- 1994
- Surface and Coatings Technology
Some Factors Affecting Hillock Formation due to PECVD Processing of Sputtered Al-4% Cu-1% Si Films
- V.J. Minkiewicz
- J.O. Moore
- et al.
- 1992
- JES
Reactive ion etching induced corrosion of Al and Al-Cu films
- Wen-Yaung Lee
- J.M. Eldridge
- et al.
- 1981
- Journal of Applied Physics