Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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84 results for Lawrence Clevenger

Phase formation sequences in the silicon-phosphorus system: Determined by in-situ synchrotron and conventional X-ray diffraction measurements and predicted by a theoretical model
- - J.R.A. Carlsson
  - L. Clevenger
  - et al.
- 1997
- Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
Formation of a crystalline metal-rich suicide in thin film titanium/silicon reactions
- - L. Clevenger
  - C. Cabral Jr.
  - et al.
- 1996
- Thin Solid Films
Investigation of titanium silicide formation in Ti+Si reactions using infrared spectroscopy and x-ray diffraction
- - K.L. Saenger
  - C. Cabral Jr.
  - et al.
- 1995
- Journal of Applied Physics
Reduction of the C54-TiSi₂ phase transformation temperature using refractory metal ion implantation
- - R. Mann
  - G.L. Miles
  - et al.
- 1995
- Applied Physics Letters
A kinetic study of the C49 to C54 TiSi₂ conversion using electrical resistivity measurements on single narrow lines
- - K.L. Saenger
  - C. Cabral
  - et al.
- 1995
- Journal of Applied Physics
A comparison of C54-TiSi2 formation in blanket and submicron gate structures using in situ x-ray diffraction during rapid thermal annealing
- - J. Bucchignano
  - G.B. Stephenson
  - et al.
- 1995
- Journal of Materials Research
In situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
- - R.A. Roy
  - L. Clevenger
  - et al.
- 1995
- Applied Physics Letters
Intermetallic formation in copper/magnesium thin films - Kinetics, nucleation and growth, and effect of interfacial oxygen
- - B. Arcot
  - S.P. Murarka
  - et al.
- 1994
- Journal of Applied Physics
Study of C49-TiSi₂ and C54-TiSi₂ formation on doped polycrystalline silicon using in situ resistance measurements during annealing
- - L. Clevenger
  - R. Mann
  - et al.
- 1994
- Journal of Applied Physics
The C49 to C54 Phase Transformation in TiSi²Thin Films
- - L. Clevenger
  - R. Mann
- 1994
- JES