Dissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
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21 results for Vivek M. Prabhu
Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Polymer dynamics and diffusive properties in ultra-thin photoresist films
- Christopher L. Soles
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Deprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Polyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
The effect of solvent quality on pathway-dependent solution-state self-assembly of an amphiphilic diblock copolymer
- Shrinivas Venkataraman
- Guangmin Wei
- et al.
- 2020
- Journal of Applied Physics