Plasma diagnostics of an rf-sputtering glow discharge
- J.W. Coburn
- Eric Kay
- 2003
- Applied Physics Letters
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Glow-discharge mass spectrometry - Technique for determining elemental composition profiles in solids
- J.W. Coburn
- E. Taglauer
- et al.
- 2003
- Journal of Applied Physics
Etching of silicon and silicon dioxide by halofluorocarbon plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 2000
- Journal of Physics D: Applied Physics
Ion-beam-assisted etching of Si with fluorine at low temperatures
- C.B. Mullins
- J.W. Coburn
- 1994
- Journal of Applied Physics
Role of ions in reactive ion etching
- J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface science aspects of etching reactions
- Harold F. Winters
- J.W. Coburn
- 1992
- Surface Science Reports
H atom reactions with GaAs 〈001〉
- Mei-Chen Chuang
- J.W. Coburn
- 1990
- Journal of Applied Physics
Surface processes in plasma-assisted etching
- J.W. Coburn
- 1990
- Symposium on Process Physics and Modeling in Semiconductor Technology 1990
Conductance considerations in the reactive ion etching of high aspect ratio features
- J.W. Coburn
- Harold F. Winters
- 1989
- Applied Physics Letters
Mass spectrometric studies of positive ions in r.f. glow discharges
- J.W. Coburn
- 1989
- Thin Solid Films