Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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159 results for F.M. D'Heurle

Reaction of titanium with germanium and silicon-germanium alloys
- - O. Thomas
  - S.L. Delage
  - et al.
- 1989
- Applied Physics Letters
Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- - O. Thomas
  - A. Charai
  - et al.
- 1989
- Thin Solid Films
Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition
- - C.Sture Petersson
  - Harry J. Whitlow
  - et al.
- 1989
- Nuclear Inst. and Methods in Physics Research, B
Note on the origin of intrinsic stresses in films deposited via evaporation and sputtering
- - F.M. D'Heurle
  - J.M.E. Harper
- 1989
- Thin Solid Films
Nucleation and growth in the reaction of titanium with germanium and some silicon-germanium alloys
- - O. Thomas
  - F.M. D'Heurle
  - et al.
- 1989
- Applied Surface Science
Bilayers with chromium disilicide: Chromium-vanadium
- - T.G. Finstad
  - O. Thomas
  - et al.
- 1989
- Applied Surface Science
Some properties of Cr_xV_1-xSi₂ and Cr_xMo_1-xSi₂ thin films
- - O. Thomas
  - Steve Molis
  - et al.
- 1989
- Applied Surface Science
Diffusion of Sb, Ga, Ge, and (As) in TiSi₂
- - P. Gas
  - G. Scilla
  - et al.
- 1988
- Journal of Applied Physics
The diffusion of elements implanted in films of cobalt disilicide
- - O. Thomas
  - P. Gas
  - et al.
- 1988
- Journal of Applied Physics
Some properties of ReSi₂
- - C. Krontiras
  - L. Grönberg
  - et al.
- 1988
- Thin Solid Films