Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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159 results for F.M. D'Heurle

Reduction of electromigration in aluminum films by copper doping
- - Irving Ames
  - Francois M. D'Heurle
  - et al.
- 2000
- IBM J. Res. Dev
Phase formation and resistivity in the ternary system Ti-Nb-Si
- - Aliette Mouroux
  - Marylène Roux
  - et al.
- 1999
- Journal of Applied Physics
In situ characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere
- - S.-L. Zhang
  - C. Lavoie
  - et al.
- 1999
- Journal of Applied Physics
Enhanced thermal stability of C49 TiSi₂ in the presence of aluminum
- - S.-L. Zhang
  - F.M. D'Heurle
  - et al.
- 1998
- Applied Physics Letters
Boron in polycrystalline Si_xGe_1-x films: Phase diagram and solid solubility
- - D. Mangelinck
  - P.-E. Hellberg
  - et al.
- 1998
- JES
Interdiffusion and phase formation in Cu(Sn) alloy films
- - L. Clevenger
  - B. Arcot
  - et al.
- 1998
- Journal of Applied Physics
Low temperature formation of C54-TiSi₂ using titanium alloys
- - C. Cabral Jr.
  - L. Clevenger
  - et al.
- 1997
- Applied Physics Letters
Oxidation of silicon-germanium alloys. I. An experimental study
- - P.-E. Hellberg
  - S.-L. Zhang
  - et al.
- 1997
- Journal of Applied Physics
Oxidation of silicon-germanium alloys. II. A mathematical model
- - P.-E. Hellberg
  - S.-L. Zhang
  - et al.
- 1997
- Journal of Applied Physics
Lowering the formation temperature of the C54-TiSi₂ phase using a metallic interfacial layer
- - C. Cabral Jr.
  - L. Clevenger
  - et al.
- 1997
- Journal of Materials Research