Summary Abstract: Modification of metals by low energy ions during thin film deposition
- J.M.E. Haroer
- J.J. Cuomo
- 1985
- JVSTA
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108 results for J.J. Cuomo
Reactive sputtering of copper and silicon near the sputtering threshold
- T.M. Mayer
- J.M.E. Harper
- et al.
- 1985
- JVSTA
Electron spectroscopy study of hydrogenated amorphous carbon films formed by methane ion beam deposition
- P. Oelhafen
- J. Freeouf
- et al.
- 1984
- Thin Solid Films
Summary Abstract: A Quantitative Ion Beam Process Applied to the Deposition of Aluminum Nitride Thin Films
- J.M.E. Harper
- H.T.G. Hentzell
- et al.
- 1984
- JVSTA
Quantitative ion beam process for the deposition of compound thin films
- J.M.E. Harper
- J.J. Cuomo
- et al.
- 1983
- Applied Physics Letters
ZrN diffusion barrier in aluminum metallization schemes
- L. Krusin-Elbaum
- M. Wittmer
- et al.
- 1983
- Thin Solid Films
Summary Abstract: Developments in broad-beam ion source technology and applications
- H.R. Kaufman
- J.J. Cuomo
- 1983
- JVSTA
Oxidation processes using ion beams
- A.W. Kleinsasser
- J.M.E. Harper
- et al.
- 1982
- Thin Solid Films
Electronic structure of amorphous Zr based alloys with V, Cr and Mn studied by photoelectron spectroscopy and bandstructure calculations
- P. Oelhafen
- V.L. Moruzzi
- et al.
- 1982
- Solid State Communications
Ion beam oxidation
- J.M.E. Harper
- M. Heiblum
- et al.
- 1981
- Journal of Applied Physics