Epitaxial growth of nickel silicide NiSi2 on silicon
- King-Ning Tu
- Eileen I. Alessandrini
- et al.
- 2014
- Japanese Journal of Applied Physics
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31 results for W.K. Chu
Empirical corrections to the energy loss of 4He ions in oxides
- J.F. Ziegler
- W.K. Chu
- et al.
- 2008
- Applied Physics Letters
An analytic solution to elastic backscattering
- W.K. Chu
- J.F. Ziegler
- 2008
- Journal of Applied Physics
Calculations of the energy loss of 4He ions in solid elements
- W.K. Chu
- V.L. Moruzzi
- et al.
- 2008
- Journal of Applied Physics
Tables of stopping cross sections for 4He ions in solids
- J.F. Ziegler
- W.K. Chu
- 2008
- Journal of Applied Physics
Identification of diffusion species in V-SiO2 reactions
- W.K. Chu
- K.N. Tu
- 2008
- Applied Physics Letters
Ion backscattering and channeling study of InAs-GaSb superlattices
- F.W. Saris
- W.K. Chu
- et al.
- 2008
- Applied Physics Letters
Laser annealing of silicon implanted with both argon and arsenic
- E. Rimini
- W.K. Chu
- et al.
- 2008
- Applied Physics Letters
Ambient effects on the diffusion of Cr and Si in thin Pt films
- Chin-An Chang
- W.K. Chu
- 2008
- Applied Physics Letters
Range distribution of implanted ions in SiO2, Si 3N4, and Al2O3
- W.K. Chu
- B.L. Crowder
- et al.
- 2003
- Applied Physics Letters