ToF-SIMS studies of nanoporous PMSSQ materials: Kinetics and reactions in the processing of low-K dielectrics for ULSI applications
- P. Lazzeri
- G.W. Rubloff
- et al.
- 2004
- Surface and Interface Analysis
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72 results for G.W. Rubloff
Role of gas phase reactions in subatmospheric chemical-vapor deposition ozone/TEOS processes for oxide deposition
- I.A. Shareef
- G.W. Rubloff
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Subatmospheric chemical vapor deposition ozone/TEOS process for SiO2 trench filling
- I.A. Shareef
- G.W. Rubloff
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Role of implantation-induced defects in surface-oriented diffusion of fluorine in silicon
- Cs. Szeles
- B. Nielsen
- et al.
- 1994
- Journal of Applied Physics
Integrated Processing of MOS Gate Dielectric Structures
- G.W. Rubloff
- M. Offenberg
- et al.
- 1994
- IEEE Trans Semicond Manuf
Chemical vapor deposition of rough-morphology silicon films over a broad temperature range
- S.S. Dana
- M. Anderle
- et al.
- 1993
- Applied Physics Letters
Positron annihilation studies in the field induced depletion regions of metal-oxide-semiconductor structures
- P. Asoka-Kumar
- T.C. Leung
- et al.
- 1992
- Journal of Applied Physics
Positron annihilation at the Si/SiO2 interface
- T.C. Leung
- Z.A. Weinberg
- et al.
- 1992
- Journal of Applied Physics
Nondestructive detection of titanium disilicide phase transformation by picosecond ultrasonics
- H.-N. Lin
- R.J. Stoner
- et al.
- 1992
- Applied Physics Letters
Anomalous diffusion of fluorine in silicon
- S.-P. Jeng
- T.P. Ma
- et al.
- 1992
- Applied Physics Letters