Micromachining applications of a high resolution ultrathick photoresist
- K.Y. Lee
- N. LaBianca
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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46 results for Jane M. Shaw
Synthesis and Properties of Highly Fluorinated Polyimides
- G. Hougham
- G. Tesoro
- et al.
- 1994
- Macromolecules
Polyanilines: In situ induced conductivity and applications thereof
- Marie Angelopoulos
- Jane M. Shaw
- 1991
- Synthetic Metals
New High-Resolution and High-Sensitivity Deep UV, X-Ray, and Electron-Beam Resists
- M. Hatzakis
- K.J. Stewart
- et al.
- 1991
- JES
Conducting polyaniline: Removable SEM discharge layer
- Marie Angelopoulos
- Jane M. Shaw
- et al.
- 1991
- Microelectronic Engineering
New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- Michael Hatzakis
- Kevin J. Stewart
- et al.
- 1990
- Microelectronic Engineering
A simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering
Silylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
A comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- E. Babich
- J.M. Shaw
- et al.
- 1987
- Microelectronic Engineering
The use of organosilicon polymers in multilayer plasma resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1987
- Microelectronic Engineering