Molecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
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29 results for N.J. Clecak
Influence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Positive tone dry-develop resist based on cross-linking a phenolic resin
- Scott A. MacDonald
- C.B. Larson
- et al.
- 1993
- Microlithography 1993
Fundamental studies of airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles
- J. Fahey
- K. Shimizu
- et al.
- 1993
- Journal of Polymer Science Part A: Polymer Chemistry
Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem
- Scott A. MacDonald
- William D. Hinsberg
- et al.
- 1993
- Chemistry of Materials
Approach toward environmental stabilization of chemical amplification resists
- Hiroshi Ito
- William P. England
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991