A highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
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29 results for N.J. Clecak
Polysilanes: solution photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- ACS PMSE 1988
Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989
Polysilanes: photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- SPE Regional Technical Conference 1988
A 2-layer resist system derived from trimethylsilylstyrene
- S.A. Macdonald
- R.D. Allen
- et al.
- 1989
- Proceedings of SPIE 1989
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
Deep UV Photoresists I. Meldrum's Diazo Sensitizer
- Barbara D. Grant
- Nicholas J. Clecak
- et al.
- 1981
- IEEE T-ED
Thermal properties of 4-alkyl-4′-cyanostilbenes: a new series of liquid crystal compounds
- Robert J. Cox
- Richard C. Gaskill
- et al.
- 1977
- Thermochimica Acta
Thermal properties of 4-alkyl-4′-cyanotolanes: a new series of liquid crystals
- Robert J. Cox
- Richard C. Gaskill
- et al.
- 1977
- Thermochimica Acta