Current Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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19 results for W.M. Moreau
Enhancement of KRS-XE for 50 keV advanced mask making applications
- Karen Petrillo
- David Medeiros
- et al.
- 2002
- SPIE Photomask Technology 2002
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Sensitivity factors of CAR electron beam resists
- David R. Medeiros
- Karen Petrillo
- et al.
- 2002
- Microlithography 2002
Conducting polyaniline coatings for submicron lithography and SEM metrology
- Teresita Graham
- Marie Angelopoulos
- et al.
- 1997
- Microlithography 1997
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
Poly(Methyl Methacrylate-isobutylene) Copolymers as Highly Sensitive Electron Beam Resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2019
- JES
Azide photoresists for projection photolithography
- N.J. Clecak
- R.J. Cox
- et al.
- 2004
- Polymer Engineering & Science
The synthesis and evaluation of cyclic olefin sulfone copolymers and terpolymers as electron beam resists
- Edward Gipstein
- Wayne Moreau
- et al.
- 2003
- Journal of Applied Polymer Science
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering