MULTILAYER RESIST SYSTEMS.
- B.J. Lin
- 1985
- ACS Division of Polymer Chemistry Chicago Meeting 1985
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10 results for B.J. Lin
Linewidth vernier (LWV)
- B.J. Lin
- 1989
- Proceedings of SPIE 1989
Portable conformable mask—A hybrid near-ultraviolet and deep-ultraviolet patterning technique
- B.J. Lin
- 1989
- Proceedings of SPIE 1989
AZ1350J as a Deep-U.V. Mask Material
- B.J. Lin
- 2019
- JES
Ultrafast deep UV lithography using excimer lasers
- K. Jain
- S. Rice
- et al.
- 2004
- Polymer Engineering & Science
A molded deep‐UV portable conformable masking system
- B.J. Lin
- V.W. Chao
- et al.
- 2004
- Polymer Engineering & Science
New lasers, VUV sources
- T. Srinivasan
- H. Egger
- et al.
- 1982
- Applied Physics B Photophysics and Laser Chemistry
Partially Coherent Imaging in Two Dimensions and the Theoretical Limits of Projection Printing in Microfabrication
- Burn Jeng Lin
- 1980
- IEEE T-ED
A double-exposure technique to macroscopically control submicrometer linewidths in positive resist images
- Burn Jeng Lin
- 1978
- IEEE T-ED
NiFe films deposited by sputter gun and applications to bubble devices
- L.J. Tao
- K.Y. Ahn
- et al.
- 1976
- Thin Solid Films