R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
A second‐generation capped deep‐UV portable conformable masking system Is described. Two major improvements of this system are; (1) The replacement of the PMMA bottom layer with the PMMA‐MA‐MAN terpolymer which has a higher thermal stability and a higher deep‐UV sensitivity. (2) The application of the mold hardening process to eliminate the “wings” protruding from the novolac‐terpolymer interface, to facilitate a better choice of developers for the bottom layer, and to provide a better refractive index match between the novolac image lines. Copyright © 1986 Society of Plastics Engineers
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
K.N. Tu
Materials Science and Engineering: A
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano