Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO2 Films Prepared Using High Pressure Oxygen
- E.A. Irene
- D.W. Dong
- et al.
- 2019
- JES
Publications
509 results at JES
Preparation and Some Properties of Chemically Vapor-Deposited Si-Rich SiO and Si3N4 Films
- D.W. Dong
- E.A. Irene
- et al.
- 2019
- JES
On the Nature of Fixed Oxide Charge
- S.I. Raider
- A. Berman
- 2019
- JES
Investigation of Laser-Enhanced Electroplating Mechanisms
- J. Cl. Puippe
- R.E. Acosta
- et al.
- 2019
- JES
Selective Studies of Chemical Vapor-Deposited Aluminum Nitride-Silicon Nitride Mixture Films
- S. Zirinsky
- E.A. Irene
- 2019
- JES
An Explanation of the Electrochromism of Lutetium Diphthalocyanine
- G.A. Corker
- B. Grant
- et al.
- 2019
- JES
The Anodic Sectioning of Beryllium
- M.T. Shehata
- Roger Kelly
- et al.
- 2019
- JES
Developer Temperature Effects on E-Beam and Optically Exposed Positive Photoresist
- J.M. Shaw
- M. Hatzakis
- 2019
- JES
Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF4-H2
- L.M. Ephrath
- 2019
- JES
II. Oxidation of Al Films
- Jean Grimblot
- Jerome M. Eldridge
- 2019
- JES