Summary Abstract: Investigation of the interface chemistry of titanium-tungsten Schottky barrier contacts to silicon by Auger spectroscopyJ.E. LewisM.O. Aboelfotohet al.1985JVSTA
Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporationD.S. YeeJ. Floroet al.1985JVSTA
Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couplesH.-O. BlomS. Berget al.1985JVSTA
Formation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti filmsE.D. AdamsK.Y. Ahnet al.1985JVSTA
Characterization of electron-beam deposited tungsten films on sapphire and siliconJ.H. SoukJ.F. O'Hanlonet al.1985JVSTA
Thermal desorption spectroscopy of Xe at the Si(111) as a local probe for surface structuresJ.W. BarthaU. Barjenbruchet al.1985JVSTA
Summary Abstract: Comparison between the adsorption of PH3 and B2H6 on Si surfaces as related to the CVD of SiM.L. YuD.J. Vitkavageet al.1985JVSTA