Effects of Several Parameters on the Corrosion Rates of Al Conductors in Integrated Circuits
- Israel Lerner
- Jerome M. Eldridge
- 2019
- JES
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Silicon Oxidation Studies: Measurement of the Diffusion of Oxidant in SiO2 Films
- E.A. Irene
- 2019
- JES
Effect of V2O3 Addition on the Thermoluminescence and Phosphorescence of Tb-Activated Garnet Phosphors
- Takeshi Takamori
- Stephen Fine
- et al.
- 2019
- JES
RIE Contamination of Etched Silicon Surfaces
- L.M. Ephrath
- R.S. Bennett
- 2019
- JES
Structural Composition of Polymers Relative to Their Plasma Etch Characteristics
- Lester A. Pederson
- 2019
- JES
Polymerization of Aromatic Silanes in RF Plasmas
- Ivan Haller
- 2019
- JES
I. Interaction of Al Films with O2 at Low Pressures
- Jean Grimblot
- Jerome M. Eldridge
- 2019
- JES
Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power Density
- R.S. Horwath
- 2019
- JES
Difluorocarbene Emission Spectra from Fluorocarbon Plasmas and its Relationship to Fluorocarbon Polymer Formation
- M.M. Millard
- E. Kay
- 2019
- JES
Parameter and Reactor Dependence of Selective Oxide RIE in CF4 + H2
- L.M. Ephroth
- E.J. Petrillo
- 2019
- JES