Predicting Radiation Sensitivity of Polymers
- C.G. Willson
- K. Kinoshita
- 2019
- JES
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Titanium Dioxide Films to Improve Photoresist Adhesion
- John C. Marinace
- Ralph C. McGibbon
- 2019
- JES
Controlled Collapse Reflow for Josephson Chip Bonding
- C.-Y. Ting
- K.R. Grebe
- et al.
- 2019
- JES
Electrical Properties of Al/Ti Contact Metallurgy for VLSI Application
- C.-Y. Ting
- B.L. Crowder
- 2019
- JES
Post-Epitaxial Polysilicon and Si3N4 Gettering in Silicon
- M.C. Chen
- V.J. Silvestri
- 2019
- JES
Effects of Ammonia Anneal on Electron Trappings in Silicon Dioxide
- D.W. Dong
- A. Hartstein
- 2019
- JES
An Electrochemically Sealed Al2O3 Passivation Layer for Aluminum Alloys
- M.H. Lee
- A. Homola
- 2019
- JES
A Viscous Flow Model to Explain the Appearance of High Density Thermal Si02 at Low Oxidation Temperatures
- E. Tierney
- J. Angilello
- 2019
- JES
Electroactive Properties of Polyaromatic Molecules
- Joachim Bargon
- A. Diaz
- 2019
- JES
Short Time Annealing of Coevaporated Tungsten Silicide Films
- T.O. Sedgwick
- F.M. d'Heurle
- et al.
- 2019
- JES