Parameter and Reactor Dependence of Selective Oxide RIE in CF4 + H2
- L.M. Ephroth
- E.J. Petrillo
- 2019
- JES
Publications
509 results at JES
Developer Temperature Effects on E-Beam and Optically Exposed Positive Photoresist
- J.M. Shaw
- M. Hatzakis
- 2019
- JES
On the Role of Buffers and Anions in NiFe Electrodeposition
- Jean Horkans
- 2019
- JES
Etching Silicon with Fluorine Gas
- M. Chen
- V.J. Minkiewicz
- et al.
- 2019
- JES
Preparation and Characterization of Ruthenium Dioxide Crystals
- M.W. Shafer
- R.A. Figat
- et al.
- 2019
- JES
Effects of Oxidation on the Atmospheric Corrosion of Permalloy Films
- Wen-Yaung Lee
- G. Scherer
- et al.
- 2019
- JES
Al Coverage of Surface Steps at SiO2 Insulated Polycrystalline Si Boundaries: Al Evaporation in Vacuum and Low Pressure Ar
- V.J. Silvestri
- V.L. Rideout
- et al.
- 2019
- JES
Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF4-H2
- L.M. Ephrath
- 2019
- JES
Combined Experimental and Modeling Study of Spatial Effects in Plasma Etching: CF4/O2 Etching of Silicon
- M. Dalvie
- K.F. Jensen
- 2019
- JES
Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF4/H2 Plasmas
- W.A. Lanford
- 2019
- JES