Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type ResinsHiroyuki HiraokaAdolfo R. Gutierrez2019JES
Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO2 Films Prepared Using High Pressure OxygenE.A. IreneD.W. Donget al.2019JES
Parameter Dependence of RIE Induced Radiation Damage in Silicon DioxideL.M. EphrarhD.J. Dimariaet al.2019JES
Maskless Laser Patterning for Gold Plating of Microelectronic MaterialsR.J. von GutfeldM.H. Gelchinskiet al.2019JES
Defect Clustering and Boron Electrical Deactivation in P-Doped Polycrystalline Diamond FilmsDario NarducciC. Richard Guarnieriet al.2019JES