Electromigration behavior of hot-sputtered Al(Cu) versus chemical vapor deposition W vias
- R. Filippi
- E.N. Levine
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.