Interaction Between ti and SiO2
- C.-Y. Ting
- M. Wittmer
- et al.
- 2019
- JES
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Low Energy Proton Beam Lithography with a Thin Oxygen-Etch Barrier Layer
- H. Hiraoka
- 2019
- JES
Diffusion of Ion-Implanted Arsenic in Thermally Grown SiO2Films
- D.R. Young
- H. Kräutle
- et al.
- 2019
- JES
Phosphorus-Doped Polycrystalline Silicon via LPCVD: II. Surface Interactions of the Silane/Phosphine/Silicon System
- B.S. Meyerson
- M.L. Yu
- 2019
- JES
Phosphorus-Doped Polycrystalline Silicon via LPCVD: I. Process Characterization
- B.S. Meyerson
- W.L. Olbricht
- 2019
- JES
An XPS and TEM Study of Intrinsic Adhesion Between Polyimide and Cr Films
- N.J. Chou
- D.W. Dong
- et al.
- 2019
- JES
Heating Effects In Reactive Etching Of Nb And Nb205
- Young H. Lee
- 2019
- JES
Substituent Effect on Para-Substituted n-phenylpyrrole Monomers and Their Polyheterocyclic Conductors
- M.C. Rock
- Ma. Eugenia Carbajal
- et al.
- 2019
- JES
The Effect of Cyanide on the Oxidation of Formaldehyde on Au, Cu, and Pd Electrodes
- Jean Horkans
- 2019
- JES
Low Energy X-Ray and Electron Damage to IGFET Gate Insulators
- C.J. Merz
- J.R. Maldonado
- et al.
- 2019
- JES