Kinetics of thermal and acid-catalyzed deprotection in deep-UV resist materials
- G.M. Wallraff
- John M. Hutchinson
- et al.
- 1995
- Microelectronic Engineering
Publications
221 results at Microelectronic Engineering
Stress induced leakage currents in thin oxides
- D.J. DiMaria
- 1995
- Microelectronic Engineering
Determination of Helium presence in the mask/wafer gap of X-ray lithography steppers
- Juan R. Maldonado
- Ron DellaGuardia
- et al.
- 1995
- Microelectronic Engineering
A new mask lithography tool for advanced mask manufacturing
- B.J. Grenon
- H.C. Hamaker
- et al.
- 1995
- Microelectronic Engineering
Dissociation kinetics of hydrogen-passivated (100) Si SiO2 interface defects
- 1995
- Microelectronic Engineering
The nanometer age: Challenge and chance
- H. Rohrer
- 1995
- Microelectronic Engineering
Improved underlayers for acid amplified resists
- H.S. Sachdev
- R.W. Kwong
- et al.
- 1994
- Microelectronic Engineering
Photolithography overview for 64 megabit production
- T. Leslie
- W. Arden
- et al.
- 1994
- Microelectronic Engineering
Using simulation to analyze integrated tool performance in semiconductor manufacturing
- John Mauer
- Roland Schelasin
- 1994
- Microelectronic Engineering
High-resolution electron-beam lithography for fabricating visible semiconductor lasers with curved mirrors and integrated holograms
- P. Unger
- V. Boegli
- et al.
- 1994
- Microelectronic Engineering