Temperature distribution in an ideal azimuthally symmetric chemicalvapor-deposition reactor
- David E. Kotecki
- Richard A. Conti
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.