Visualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Publications
14341 results for Physical Sciences
Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- Guillaume Landie
- Yongan Xu
- et al.
- 2011
- SPIE Advanced Lithography 2011
Single exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Integrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
GaAs on 200 mm Si wafers via thin temperature graded Ge buffers by molecular beam epitaxy
- M. Richter
- Christophe Rossel
- et al.
- 2011
- Journal of Crystal Growth
Microfluidic chips for point-of-care immunodiagnostics
- Luc Gervais
- Nico De Rooij
- et al.
- 2011
- Advanced Materials
Structure and stability under pressure of cubic and hexagonal diamond crystals of C, BN and Si from first principles
- S.L. Qiu
- P.M. Marcus
- 2011
- Journal of Physics Condensed Matter
Single photon detectors for ultra low voltage time-resolved emission measurements
- Franco Stellari
- Peilin Song
- et al.
- 2011
- IEEE JQE