Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)

Abstract

In this work, we investigate the Negative Tone Develop (NTD) process from a fundamental materials/process interaction perspective. Several key differences exist between a negative tone develop process and a traditional positive tone develop system. For example, the organic solvent dissolves the unexposed material, while the deprotected resist remains intact. This causes key differences in key patterning properties, such as pattern collapse, adhesion, remaining resist, and photoresist etch selectivity. We have carried out fundamental studies to understand these new interactions between developer and remaining resist with negative tone develop systems. We have characterized the dynamic dissolution behavior of a model system with a quartz crystal microbalance with both positive and negative tone solvent developers. We have also compared contrast curves, and a fundamental model of image collapse. In addition, we present first results on Optical Proximity Correction (OPC) modeling results of current Negative Tone Develop (NTD) resist/developer systems. © 2011 SPIE.