Contact Cavity Shaping and Selective SiGe:B Low-Temperature Epitaxy Process Solution for sub 10-9 Ω.cm2 Contact Resistivity in Nonplanar FETsN. BreilB.-C. Leeet al.2023VLSI Technology 2023
Benchmarking novel AI accelerators: striving to be both fair and comprehensiveGeoffrey Burr2023VLSI Technology 2023
In-memory computing for accelerating deep neural networks and neuro-vector-symbolic architecturesManuel Le GalloIrem Boybat-Karaet al.2023AICAS 2023
CFD Simulation Analysis of Inter/Intra Chip Liquid Cooling for 3D Stacked ICsRisa MiyazawaHiroyuki Moriet al.2023iTHERM 2023
HBM3 Modules on Latest High Density Organic Laminate—Signal Integrity Design and Analysis with Interconnect Budget ResultsFrank R. LibschHiroyuki Mori2023ECTC 2023
Development of a Plasma Etching Process of Copper for the Microfabrication of High-Density Interconnects in Advanced PackagingJuliano BorgesMaxime Darnonet al.2023ECTC 2023
Volume-controllable Solder Bumping Technology to Package Substrate Using Injection Molded Solder for Fine-pitch Flip ChipToyohiro AokiKatsuyuki Sakumaet al.2023ECTC 2023
Heterogeneous Integration on Organic Interposer Substrate with fine-pitch RDL and 40 micron pitch Micro-bumpsKatsuyuki SakumaGriselda Bonillaet al.2023ECTC 2023
On the path to AI hardware via chiplet integration enabled by high density organic substratesGriselda BonillaBrian Quinlanet al.2023ECTC 2023