Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
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21 results at SPIE Advanced Lithography 2009
A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit
- Gonzalo R. Feijóo
- Jaione Tirapu-Azpiroz
- et al.
- 2009
- SPIE Advanced Lithography 2009
Contact mask optimization and SRAF design
- Uwe P. Schroeder
- Cyrus Tabery
- et al.
- 2009
- SPIE Advanced Lithography 2009
C-Quad polarized illumination for back end thin wire: Moving beyond annular illumination regime
- Sohan Singh Mehta
- Hyung-Rae Lee
- et al.
- 2009
- SPIE Advanced Lithography 2009
Intensive optimization of masks and sources for 22nm lithography
- Alan E. Rosenbluth
- David O. Melville
- et al.
- 2009
- SPIE Advanced Lithography 2009
22 nm technology node active layer patterning for planar transistor devices
- Ryoung-Han Kim
- Steven Holmes
- et al.
- 2009
- SPIE Advanced Lithography 2009
Source optimization for three-dimensional image designs through film stacks
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Overcoming the challenges of 22-nm node patterning through litho-design co-optimization
- Martin Burkharde
- J.C. Arnold
- et al.
- 2009
- SPIE Advanced Lithography 2009
Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- Hiroshi Ito
- Linda K. Sundberg
- et al.
- 2009
- SPIE Advanced Lithography 2009