Modeling and experiments of non-telecentric thick mask effects for EUV lithography
- Gregory McIntyre
- Chiew-Seng Koay
- et al.
- 2009
- SPIE Advanced Lithography 2009
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21 results at SPIE Advanced Lithography 2009
Characterization of vinyl ether UV-cure nanoimprint resist
- Taiichi Furukawa
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Exposure tool settings and OPC strategies for EUV Lithography at the 16nm node
- Yunfei Deng
- Jongwook Kye
- et al.
- 2009
- SPIE Advanced Lithography 2009
Flare evaluation of ASML alpha demo tool
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- SPIE Advanced Lithography 2009
Compensating non-optical effects using electrically-driven optical proximity correction
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2009
- SPIE Advanced Lithography 2009
Modeling and simulation of transistor performance shift under pattern-dependent RTA process
- Yun Ye
- Frank Liu
- et al.
- 2009
- SPIE Advanced Lithography 2009
Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators
- Lynn T.-N. Wang
- Liang-Teck Panga
- et al.
- 2009
- SPIE Advanced Lithography 2009
Cr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture
- Gregory McIntyre
- Richard Tu
- 2009
- SPIE Advanced Lithography 2009
The measurement uncertainty challenge of advanced patterning development 727203
- Narender Rana
- Chas Archie
- et al.
- 2009
- SPIE Advanced Lithography 2009