193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
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13 results at Microlithography 2004
Mesoscale modeling for SFIL simulating polymerization kinetics and densification
- Ryan L. Burns
- Stephen C. Johnson
- et al.
- 2004
- Microlithography 2004
Modeling for profile-based process-window metrology
- Christopher P. Ausschnitt
- Shaunee Y. Cheng
- 2004
- Microlithography 2004