Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
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13 results at Microlithography 2004
Combinatorial resist processing studies
- Carl E. Larson
- Gregory M. Wallraff
- 2004
- Microlithography 2004
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Rinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Reactive dissolution kinetics of lithographic copolymers
- William Hinsberg
- Frances Houle
- et al.
- 2004
- Microlithography 2004
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004