EUV patterning successes and frontiers
- Nelson Felix
- Daniel Corliss
- et al.
- 2016
- SPIE Advanced Lithography 2016
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19 results at SPIE Advanced Lithography 2016
Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- R. Muthinti
- Nicolas Loubet
- et al.
- 2016
- SPIE Advanced Lithography 2016
Assessments of image-based and scatterometry-based overlay targets
- Chiew-Seng Koay
- Nelson Felix
- et al.
- 2016
- SPIE Advanced Lithography 2016
Acid generation efficiency: EUV photons versus photoelectrons
- Dario Goldfarb
- Ali Afzali-Ardakani
- et al.
- 2016
- SPIE Advanced Lithography 2016
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2016
- SPIE Advanced Lithography 2016
PVD prepared molecular glass resists for scanning probe lithography
- Christian Neuber
- Hans-Werner Schmidt
- et al.
- 2016
- SPIE Advanced Lithography 2016
Contrast enhanced diffusion NMR: Quantifying impurities in block copolymers for DSA
- Rudy J. Wojtecki
- Ellie Porath
- et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line metrology strategy for self-aligned quadruple patterning
- Robin Chao
- Mary Breton
- et al.
- 2016
- SPIE Advanced Lithography 2016
Comparison of left and right side line edge roughness in lithography
- Lei Sun
- Nicole Saulnier
- et al.
- 2016
- SPIE Advanced Lithography 2016