Publications

19 results at SPIE Advanced Lithography 2016

Modeling and parameter tuning for templated directed self-Assembly
- - Balint Meliorisz
  - T. Mülders
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Evaluation of ALE processes for patterning
- - J. M. Papalia
  - Nathan Marchack
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Comparison of left and right side line edge roughness in lithography
- - Lei Sun
  - Nicole Saulnier
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- - Kristin Schmidt
  - Hitoshi Osaki
  - et al.
- 2016
- SPIE Advanced Lithography 2016
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Contrast enhanced diffusion NMR: Quantifying impurities in block copolymers for DSA
- - Rudy J. Wojtecki
  - Ellie Porath
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line metrology strategy for self-aligned quadruple patterning
- - Robin Chao
  - Mary Breton
  - et al.
- 2016
- SPIE Advanced Lithography 2016
PVD prepared molecular glass resists for scanning probe lithography
- - Christian Neuber
  - Hans-Werner Schmidt
  - et al.
- 2016
- SPIE Advanced Lithography 2016