A novel inspection and annealing procedure to rejuvenate phase change memory from cycling-induced degradations for storage class memory applicationsWin-San KhwaJau-Yi Wuet al.2014IEDM 2014
First demonstration of high-Ge-content strained-Si1-xGex (x=0.5) on insulator PMOS FinFETs with high hole mobility and aggressively scaled fin dimensions and gate lengths for high-performance applicationsPouya HashemiKarthik Balakrishnanet al.2014IEDM 2014
0.026μm2 high performance Embedded DRAM in 22nm technology for server and SOC applicationsC. PeiG. Wanget al.2014IEDM 2014
High performance 14nm SOI FinFET CMOS technology with 0.0174μm2 embedded DRAM and 15 levels of Cu metallizationC.-H.C-H. LinBrian Greeneet al.2014IEDM 2014