Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2014
- SPIE Advanced Lithography 2014
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17 results at SPIE Advanced Lithography 2014
Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
Clear sub-resolution assist features for EUV
- Martin Burkhardt
- Greg McIntyre
- et al.
- 2014
- SPIE Advanced Lithography 2014
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014
Towards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
Molecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014
Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014