Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
- T.A. Brunner
- V. Menon
- et al.
- 2014
- SPIE Advanced Lithography 2014
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17 results at SPIE Advanced Lithography 2014
Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Fast detection of novel problematic patterns based on dictionary learning and prediction of their lithographic difficulty
- F. De Morsier
- David Demaris
- et al.
- 2014
- SPIE Advanced Lithography 2014
Computational lithography platform for 193i-guided directed self-assembly
- Kafai Lai
- Melih Ozlem
- et al.
- 2014
- SPIE Advanced Lithography 2014
Automated sample plan selection for OPC modeling
- Nathalie Casati
- Maria Gabrani
- et al.
- 2014
- SPIE Advanced Lithography 2014
Estimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
- Benoit Seguin
- Henri Saab
- et al.
- 2014
- SPIE Advanced Lithography 2014
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Closed-loop high-speed 3D thermal probe nanolithography
- Armin W. Knoll
- Michal Zientek
- et al.
- 2014
- SPIE Advanced Lithography 2014