Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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14 results at SPIE Advanced Lithography 2013
Enabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- Bassem Hamieh
- Hyun Chol Choi
- et al.
- 2013
- SPIE Advanced Lithography 2013
Computational aspects of optical lithography extension by Directed Self-Assembly
- Kafai Lai
- Chi-Chun Liu
- et al.
- 2013
- SPIE Advanced Lithography 2013
Benchmarking study of 3D mask modeling for 2 and 1x nodes
- Chang An Wang
- Chao-Chun Liang
- et al.
- 2013
- SPIE Advanced Lithography 2013