Buckling characterization of gate all around silicon nanowires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2013
- SPIE Advanced Lithography 2013
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14 results at SPIE Advanced Lithography 2013
CD optimization methodology for extending optical lithography
- C. Wong
- G. Seevaratnam
- et al.
- 2013
- SPIE Advanced Lithography 2013
Advanced plasma etch for the 10nm node and beyond
- Eric Joseph
- Sebastian Engelmann
- et al.
- 2013
- SPIE Advanced Lithography 2013
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013
Etch correction and OPC, a look at the current state and future of etch correction
- Ian Stobert
- Derren Dunn
- 2013
- SPIE Advanced Lithography 2013
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- Greg McIntyre
- Leon Teeuwen
- et al.
- 2013
- SPIE Advanced Lithography 2013
On the accuracy of different Fourier transforms of VLSI designs
- Rajai Nasser
- Paul Hurley
- 2013
- SPIE Advanced Lithography 2013
Directed self-assembly process implementation in a 300mm pilot line environment
- Chi-Chun Liu
- I. Cristina Estrada-Raygoza
- et al.
- 2013
- SPIE Advanced Lithography 2013
Deterministically isolated gratings through the directed self-assembly of block copolymers
- Gregory Sadasdf Doerk
- Joy Y. Cheng
- et al.
- 2013
- SPIE Advanced Lithography 2013
Development of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013