Lithography and self-assembly for nanometer scale magnetism
- S. Anders
- S. Sun
- et al.
- 2002
- Microelectronic Engineering
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221 results at Microelectronic Engineering
Imaging of oxide and interface charges in SiO2-Si
- R. Ludeke
- E. Cartier
- 2001
- Microelectronic Engineering
Ultrathin high-K metal oxides on silicon: Processing, characterization and integration issues
- E. Gusev
- E. Cartier
- et al.
- 2001
- Microelectronic Engineering
High quality interfacial layer formation for Si0.75Ge0.25 (100) high-k metal gate stack
- S. Siddiqui
- R. Galatage
- et al.
- 2020
- Microelectronic Engineering
AC conductivity analysis as a measure of low k dielectric capacitor reliability degradation due to moisture ingress
- Cyril Cabral
- Robert B. Laibowitz
- et al.
- 2020
- Microelectronic Engineering
Impact of surface preparation for n-type Si:P and p-type SiGe:B semiconductors on low resistance silicide contacts
- A. Carr
- B. Peethala
- et al.
- 2017
- Microelectronic Engineering
Electron beam generated plasmas: Characteristics and etching of silicon nitride
- S. G. Walton
- D. R. Boris
- et al.
- 2017
- Microelectronic Engineering
Impact of HF-based cleaning solutions on via resistance for sub-10 nm BEOL structures
- B. Peethala
- F. Mont
- et al.
- 2016
- Microelectronic Engineering
Analysis of the Pockels effect in ferroelectric barium titanate thin films on Si(0 0 1)
- Kristy J. Kormondy
- Stefan Abel
- et al.
- 2015
- Microelectronic Engineering
Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
- V. Djara
- Marilyne Sousa
- et al.
- 2015
- Microelectronic Engineering