Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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2353 results at Journal of Applied Physics

Effect of temperature on electrical and microstructural changes of coevaporated Ir-Si alloy films
- - B.Z. Weiss
  - K.N. Tu
  - et al.
- 1986
- Journal of Applied Physics
Disilicide solid solutions, phase diagram, and resistivities. I. TiSi ₂-WSi₂
- - P. Gas
  - F.J. Tardy
  - et al.
- 1986
- Journal of Applied Physics
A reinvestigation of the etch products of silicon and XeF₂: Doping and pressure effects
- - F.A. Houle
- 1986
- Journal of Applied Physics
Doping dependence of the schottky-barrier height of ti-pt contacts to n-gallium arsenide
- - R.F. Broom
  - H.P. Meier
  - et al.
- 1986
- Journal of Applied Physics
Rutherford backscattering studies of plasma-etched silicon
- - Gottlieb S. Oehrlein
- 1986
- Journal of Applied Physics
Stability of oxides grown on tantalum silicide surfaces
- - A. Cros
  - K.N. Tu
- 1986
- Journal of Applied Physics
Dynamics of UV laser ablation of organic polymer surfaces
- - E. Sutcliffe
  - R. Srinivasan
- 1986
- Journal of Applied Physics
Electron heating in silicon nitride and silicon oxynitride films
- - D.J. DiMaria
  - J.R. Abernathey
- 1986
- Journal of Applied Physics
Hole transport in a molecularly doped polymer: P-diethylaminobenzaldehyde- diphenyl hydrazone in polycarbonate
- - L.B. Schein
  - A. Rosenberg
  - et al.
- 1986
- Journal of Applied Physics
Boron, phosphorus, and arsenic diffusion in tisi₂
- - P. Gas
  - V.R. Deline
  - et al.
- 1986
- Journal of Applied Physics